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Publication Type J
Authors Soleimannejad, Z., A. Abdolzadeh and H. R. Sadeghipour
Title Beneficial Effects of Silicon Application in Alleviating Salinity Stress in Halophytic Puccinellia Distans Plants
Source Silicon
Author Keywords ATPase activity Halophyte Puccinellia distans Salinity Silicon reduces sodium uptake oryza-sativa l. plasma-membrane salt tolerance h+-atpase growth leaves accumulation responses barley
Abstract Little is known on the impact of silicon (Si) nutrition in halophytes. Accordingly, response of Si accumulating halophyte Puccinellia distans to Si nutrition was investigated. The experiment was carried out as factorial in a completely randomized design. Plants were hydroponically raised for six weeks under two salinity (0 and 200 mmol L-1 NaCl) and Si (0 and 1.5 mmol L-1 Na2SiO3) levels. Si improved plant dry weight and water relations under salinity. Salinity decreased the plant relative water content (RWC) but Si increased this parameter. Transpiration rate and stomatal density however, declined by salinity and Si even intensified these salt effect. Si affected salt tolerance mechanisms in P. distans. Thus, +Si plants had greater soluble sugars and amino acids and lower Na+ but increased cellulose and lignin and Na+ secretion from leaves. These possibly indicate more efficient osmotic adjustment and better operation of either salt exclusion and / or excretion mechanisms. In congruence, Si greatly enhanced the activity of H+-ATPase in both roots and shoots. +Si plants had reduced stress symptoms evidenced by lower proline and reduced electrolyte leakage indicating better membrane functioning. Altogether, Si application led to better performance of P. distans plants under saline conditions.
Author Address [Soleimannejad, Zahra; Abdolzadeh, Ahmad; Sadeghipour, Hamid Reza] Golestan Univ, Dept Biol, Gorgan 4913815759, Golestan, Iran. Abdolzadeh, A (reprint author), Golestan Univ, Dept Biol, Gorgan 4913815759, Golestan, Iran. ah_ab99@yahoo.com
ISSN 1876-990X
ISBN 1876-990X
29-Character Source Abbreviation Silicon
Publication Date Apr
Year Published 2019
Volume 11
Issue 2
Beginning Page 1001-1010
Digital Object Identifier (DOI) 10.1007/s12633-018-9960-7
Unique Article Identifier WOS:000464721100042
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